https://pubs.rsc.org/en/Content/ArticleLanding/2015/TC/C5TC01384D
Atomic layer deposition of transparent semiconducting oxide CuCrO2 thin films - Journal of...
Atomic layer deposition (ALD) is a vital gas-phase technique for atomic-level thickness-controlled deposition of high-quality thin films on various substrate...
atomic layer depositionthin filmstransparent