https://pubs.rsc.org/en/content/articlelanding/2018/TC/C7TC05961B
Low resistivity HfNx grown by plasma-assisted ALD with external rf substrate biasing - Journal of...
Plasma-assisted atomic layer deposition (ALD) of HfNx thin films using tris(dimethylamino)cyclopentadienylhafnium [CpHf(NMe2)3] as the Hf precursor and H2...