https://research.tudelft.nl/en/publications/profile-engineering-of-decreasing-arsenic-doping-in-silicon-rpcvd/
Profile Engineering of Decreasing Arsenic Doping in Silicon RPCVD - TU Delft Research Portal
https://research.tudelft.nl/en/publications/the-influence-of-growth-kinetics-on-the-relaxation-of-epitaxially-2/
The influence of growth kinetics on the relaxation of epitaxially grown RPCVD Si1-xGex - TU Delft...