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光刻胶等离子灰化去胶-PR Plasma Ashing
氧气等离子体灰化去胶的原理是利用电压放电，把氧气（O2）电离成激发态的氧原子（O），然后氧原子和抗蚀剂中的C和H快速反应，生成CO、CO2和H2O等挥发性气体，用机械泵抽走，以达到去胶的目的。
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https://www.inseto.com/equipment/plasma-cleaning-and-etching-by-plasma-etch/benchtop-plasma-cleaners-and-etchers/benchtop-plasma-ion-etcher-plasma-cleaner-pe-100/
Convertible RIE Plasma Etching System | Semiconductor Ashing
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Father Andrew visits BW for Lenten Ashing - Father Andrew visits BW for Lenten Ashing - News - The...
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https://pacificcombustion.com/carbolite-aaf-bal-11-17-ashing-furnace-1100c-integrated-balance-for-tga-loi-testing/
Carbolite AAF-BAL 11/17 Ashing Furnace – 1100°C | Integrated Balance for TGA
Ashing furnace with built-in balance for real-time LOI and TGA testing. 1100°C max temp, 17L volume, and digital PID control. Data-ready and ISO compliant.
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