https://www.nokia.com/bell-labs/publications-and-media/publications/growth-and-characterization-of-an-ultrathin-cobalt-silicide-film-on-si311/
We report the results of a study of a 25angstroms film of Co deposited on Si(311) at near room temperature and reacted at 500C. We find the film to consist...
cobalt silicidegrowthcharacterizationultrathinfilm