https://www.iws.fraunhofer.de/en/newsandmedia/news/2020-11-24_news_euv_zukunftspreis.html
EUV lithography opened the door to digital age - Fraunhofer IWS
Review on the award of the German Future Prize 2020 (Deutscher Zukunftspreis 2020) to Trumpf, Zeiss and Fraunhofer
euv lithographythe doordigital ageopenedfraunhofer
https://www.tomshardware.com/tech-industry/semiconductors/asml-projects-usd71-billion-in-revenue-by-2030-as-demand-for-euv-lithography-machines-intensifies-due-to-ai-boom-china-sales-lag-behind-while-company-cashes-in-on-high-end-twinscan-systems
ASML projects $71 billion in revenue by 2030, as demand for EUV lithography machines intensifies...
Jan 29, 2026 - Everyone wants EUV machines but Chinese chipmakers cannot get them.
https://research.ibm.com/publications/introduction-of-pre-etch-deposition-techniques-in-euv-patterning
Introduction of pre-etch deposition techniques in EUV patterning for SPIE Advanced Lithography 2018...
Introduction of pre-etch deposition techniques in EUV patterning for SPIE Advanced Lithography 2018 by Xun Xiang et al.
https://research.ibm.com/publications/investigation-of-alternate-mask-absorbers-in-euv-lithography
Investigation of alternate mask absorbers in EUV lithography for SPIE Advanced Lithography 2017 -...
Investigation of alternate mask absorbers in EUV lithography for SPIE Advanced Lithography 2017 by Martin Burkhardt
https://www.tomshardware.com/tag/high-na
High-NA EUV: Extreme ultraviolet lithography | Tom's Hardware
High NA extreme ultraviolet lithography is the cutting edge of CPU fabrication. Here's everything you need to know
highnaeuvextremeultraviolet
https://www.globaltimes.cn/content/1210195.shtml
China asks the Netherlands to treat Huawei, supply of EUV lithography, fairly - Global Times
China's Ministry of Commerce suggested the Netherlands to take a fair, transparent and open stance towards Huawei's 5G and supply of its EUV lithography...
https://research.ibm.com/publications/multi-reticle-stitching-applications-from-packaging-to-high-na-euv
Multi-reticle stitching: Applications from packaging to High-NA EUV for SPIE Advanced Lithography +...
Multi-reticle stitching: Applications from packaging to High-NA EUV for SPIE Advanced Lithography + Patterning 2025 by Chris Bottoms et al.
https://newsroom.ibm.com/2025-09-24-screen-and-ibm-sign-agreement-for-next-generation-euv-lithography-cleaning-process-development
SCREEN and IBM Sign Agreement for Next-Generation EUV Lithography Cleaning Process Development
SCREEN Semiconductor Solutions Co., Ltd. and IBM announced an agreement to develop cleaning processes for next-generation EUV lithography. This agreement...
https://meetings-archive.aps.org/dpp/2006/gp1/90/
ZaP Flow Z-pinch EUV Light Source for Lithography - Status and prospects for the fast ignition...
The density of features on semiconductor integrated chips (ICs) can increase as the wavelength of the light used for lithography decreases. Present lithography