photoresists - Robuta Search

https://research.ibm.com/publications/polymer-platform-dependent-characteristics-of-193-nm-photoresists Polymer platform dependent characteristics of 193 nm photoresists for SPIE Advances in Resist... Polymer platform dependent characteristics of 193 nm photoresists for SPIE Advances in Resist Technology and Processing 1999 by Juliann Opitz et al. https://pubchem.ncbi.nlm.nih.gov/patent/EP-0466359-B2 Process for making low optical density polymers and copolymers for photoresists and optical... EP-0466359-B2 chemical patent summary. process making low optical density https://collaborate.princeton.edu/en/publications/plasma-surface-interactions-of-advanced-photoresists-with-c4-f8-a/fingerprints/ Plasma-surface interactions of advanced photoresists with C4 F8 Ar discharges: Plasma parameter... https://vivo.colorado.edu/display/pubid_110493 Chemical imaging of photoresists with coherent anti-Stokes Raman scattering (CARS) microscopy | CU... https://www.irresistiblematerials.com/ Irresistible Materials | Next-Gen EUV Photoresists Next-generation EUV photoresists with patented MTR™ platform. Improve throughput, reduce variability, and enable advanced chip manufacturing. next gen irresistible materials euv photoresists https://research.ibm.com/publications/negative-photoresists-for-optical-lithography Negative photoresists for optical lithography for IBM J. Res. Dev - IBM Research Negative photoresists for optical lithography for IBM J. Res. Dev by J.M. Shaw et al. negative photoresists optical lithography ibm https://news.cgtn.com/news/2019-08-20/Japan-again-approves-shipment-of-photoresists-to-South-Korea-JiVIecXjq0/index.html Japan again approves shipment of photoresists to South Korea - CGTN Japan has approved shipment of a high-tech material to South Korea for the second time since imposing export curbs last month, Yonhap News Agency reported late... south korea japan approves shipment photoresists https://publications-cnrc.canada.ca/eng/view/object/?id=77b15b94-9957-493f-81cd-fb416cfb9e33 Silicon containing organic-inorganic hybrid materials as EUV photoresists - NRC Publications... Silicon containing organic-inorganic hybrid materials as EUV photoresists silicon containing organic hybrid https://research.ibm.com/publications/studies-of-acid-diffusion-in-low-ea-chemically-amplified-photoresists Studies of acid diffusion in low Ea chemically amplified photoresists for Microlithography 2005 -... Studies of acid diffusion in low Ea chemically amplified photoresists for Microlithography 2005 by G.M. Wallraff et al. https://research.ibm.com/publications/modeling-projection-printing-of-positive-photoresists Modeling Projection Printing of Positive Photoresists for IEEE T-ED - IBM Research Modeling Projection Printing of Positive Photoresists for IEEE T-ED by James A. Tuttle et al. https://pure.psu.edu/en/publications/measurements-of-the-reaction-diffusion-front-of-model-chemically-/ Measurements of the reaction-diffusion front of model chemically amplified photoresists with... of the reaction diffusion measurements https://research.ibm.com/publications/commercialization-of-non-pfas-krf-and-development-of-non-pfas-euv-photoresists Commercialization of Non-PFAS KrF and Development of Non-PFAS EUV Photoresists for SPIE Advanced... Commercialization of Non-PFAS KrF and Development of Non-PFAS EUV Photoresists for SPIE Advanced Lithography 2025 by Cong Liu et al. https://pubchem.ncbi.nlm.nih.gov/patent/US-2002051932-A1 Photoresists for imaging with high energy radiation - Patent US-2002051932-A1 - PubChem US-2002051932-A1 chemical patent summary. high energy