https://resources.sw.siemens.com/pl-PL/technical-paper-comparing-multi-patterning-at-5nm-sadp-saqp-and-salele/
Comparing multi-patterning at 5nm: SADP, SAQP, and SALELE | Siemens
Siemens EDA and IMEC analyze self-aligned double and quadruple patterning (SADP, SAQP) and self-aligned litho-etch litho-etch (SALELE) options to optimize both...
comparingmultipatterningsalelesiemens