Robuta

https://repositum.tuwien.at/handle/20.500.12708/188155 reposiTUm: Modeling Incomplete Conformality During Atomic Layer Deposition in High Aspect Ratio... atomic layer deposition aspect ratio repositum modeling incomplete https://scholarsmine.mst.edu/chem_facwork/1009/ "Deep-ultraviolet Antireflective Coating with Improved Conformality, Op" by Douglas J. Guerrero,... A new bottom antireflective coating (BARC) for 248 nm lithography is described. The new coating has an optical density of approximately 10/micrometers (k... deep ultraviolet antireflective coating douglas j improved conformality